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Global Extreme Ultraviolet Lithography Market 2023

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TABLE OF CONTENTS

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DESCRIPTION

Extreme ultraviolet lithography (EUVL) is a semiconductor manufacturing technique that uses extreme ultraviolet light to transfer circuit patterns onto silicon wafers. EUV lithography is the most promising technique for the manufacture of smaller, cheaper, and more energy-efficient chips for electronic devices such as computers, smartphones, and other electronic gadgets. There are several benefits of using EUV lithography in semiconductor manufacturing. Firstly, it enables the production of finer patterns on silicon wafers, allowing for more transistors to be crammed onto each chip. Secondly, it reduces the number of production steps required and thereby reduces the manufacturing cost. Lastly, EUV lithography helps in the production of energy-efficient chips, which have a lower power consumption and a higher performance. The global extreme ultraviolet lithography market is projected to rise by USD 15.8 billion by 2029, according to the latest market study results. It is anticipated to expand at a CAGR of 15.52 percent during the forecast period.

This industry report offers market estimates of the global market, followed by a detailed analysis of the product, application, and country. The global market data on extreme ultraviolet lithography can be segmented by product: light sources, masks, mirrors. The masks segment held the largest share of the global extreme ultraviolet lithography market in 2022 and is anticipated to hold its share during the forecast period. Extreme ultraviolet lithography market is further segmented by application: foundry, integrated device manufacturers (IDMs). Globally, the foundry segment made up the largest share of the extreme ultraviolet lithography market. Based on country, the extreme ultraviolet lithography market is segmented into: Taiwan, South Korea, United States, Rest of the World (RoW). Taiwan was the largest contributor to the global extreme ultraviolet lithography market in 2022.

The global extreme ultraviolet lithography market is highly competitive. The prominent players operating in the global extreme ultraviolet lithography market include ASML Holding NV, Intel Corporation, NTT Advanced Technology Corporation, Samsung Electronics Co. Ltd., Taiwan Semiconductor Manufacturing Company Limited, Toppan Photomasks Inc., Ushio Inc.

The data-centric report focuses on market trends, status and outlook for segments. With comprehensive market assessment across the major geographies, the report is a valuable asset for the existing players, new entrants and the future investors.

Why buy this report?
Get a detailed picture of the Global Extreme Ultraviolet Lithography Market
Identify segments/areas to invest in over the forecast period in the Global Extreme Ultraviolet Lithography Market
Understand the competitive environment, the markets leading players
The market estimate for ease of analysis across scenarios in Excel format.
Strategy consulting and research support for three months.
Print authentication provided for the single-user license.

TABLE OF CONTENTS

Part 1. Summary
Part 2. Introduction
Study period
Geographical scope
Market segmentation
Part 3. Extreme ultraviolet lithography market overview
Part 4. Market breakdown by product
Light sources
Masks
Mirrors
Part 5. Market breakdown by application
Foundry
Integrated device manufacturers (IDMs)
Part 6. Market breakdown by country
Taiwan
South Korea
United States
Rest of the World (RoW)
Part 7. Key companies
ASML Holding NV
Intel Corporation
NTT Advanced Technology Corporation
Samsung Electronics Co., Ltd.
Taiwan Semiconductor Manufacturing Company Limited
Toppan Photomasks Inc.
Ushio Inc.
Part 8. Methodology

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